Plasma Sources Science and Technology reports on non-fusion plasma sources which operate at all ranges of pressure and density including neutral and non-neutral plasma sources; positive and negative ion sources; free radical sources; microwave, RF, direct current, laser and electron beam excited sources; resonant sources; plasmas for etching, deposition, polymerization, sintering; plasma sources for accelerators; lighting applications; plasma sources for medical physics; plasma sources for lasers; other applications, e.g. spacecraft thrusters; industrial arc melting; plasmas as sources of UV and x-ray radiation; plasma source design, monitoring and control; source stability and reproducibility. Low-pressure plasma sources: distribution functions; excitation-radiation equilibria; vibrational excitation; mass, momentum and energy transport; ion implantation. Low-to-medium pressure plasma sources: plasma surface interactions; high pressure sources; thermal plasmas; plasma diagnostic techniques; plasma and plasma source modelling.

等離子體源科學(xué)和技術(shù)報(bào)告在所有壓力和密度范圍內(nèi)運(yùn)行的非聚變等離子體源，包括中性和非中性等離子體源；正負(fù)離子源；自由基源；微波、射頻、直流電、激光和電子束激發(fā)源；共振源；蝕刻、沉積、聚合、燒結(jié)用等離子體；加速器用等離子體源；照明應(yīng)用；醫(yī)學(xué)物理用等離子體源；激光用等離子體源；其他應(yīng)用，如航天器推進(jìn)器；工業(yè)電弧熔化；低壓等離子體源：分布函數(shù)；激輻射平衡；振動(dòng)激勵(lì)；質(zhì)量、動(dòng)量和能量傳輸；離子注入。中低壓等離子體源：等離子體表面相互作用；高壓源；熱等離子體；等離子體診斷技術(shù)；等離子體和等離子體源建模。